C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 9/6574 (2006.01) A61K 8/55 (2006.01) A61K 31/661 (2006.01) A61K 47/24 (2006.01) A61K 31/706 (2006.01) C07H 17/02 (2006.01)
Patent
CA 2544574
Disclosed is a compound represented by the following general formula (I): (I) (wherein R1 represent a glycosyl group, a phosphoric acid group , or a cyclic phosphoric acid group bonded with R2; R2 represents -CH2OH, -CHO, -CH2NH2, - CH2-amino acid residue or -CH2-OPO2H; and R3 represents a hydrogen atom or - PO3H2) or a salt thereof. Also disclosed is a composition for cosmetics, drugs, foods and/or animal feed which contains such a compound or a salt thereof.
Composé représenté par la formule suivante (I), dans laquelle R?1¿ représente un groupe glycosyl, un groupe acide phosphorique ou un groupe acide phosphorique cyclique lié à R?2¿; R?2¿ représente CH¿2?OH, -CHO, -CH¿2?NH¿2?, -CH¿2?- résidu d'acide aminé ou CH¿2?-OPO¿2?H; R?3¿ représente un atome d'hydrogène ou PO¿3?H¿2?, ou un de ses sels. L'invention concerne également une composition élaborée pour des cosmétiques, des médicaments, des produits alimentaires humains et/ou animaux qui contient ce composé ou un de ses sels.
Ito Hajime
Maniwa Fumio
Morimoto Hiroshi
Sakamoto Keiji
Shimmoto Yukiko
Daiichi Fine Chemical Co. Ltd.
Fetherstonhaugh & Co.
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