Stripping compositions and methods of stripping resists from...

Details Stripping compositions and methods of stripping resists from... Stripping compositions and methods of stripping resists from...

G - Physics

03

F

149/28, 96/65

G03F 7/42 (2006.01)

Patent

CA 1329037

STRIPPING COMPOSITIONS AND METHODS OF STRIPPING RESISTS FROM SUBSTRATES ABSTRACT OF THE DISCLOSURE Photoresist stripping compositions comprise a mixture of a 2-pyrrolidinone compound, a tetrahydrothiophene-1,1- dioxide compound, a polyethylene glycol, a diethylene glycol monoalkyl ether and an amine or amine derivative.

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