C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
96/155, 260/552,
C07C 255/36 (2006.01) C07C 229/44 (2006.01) C07C 255/34 (2006.01) C07C 255/42 (2006.01) C07C 309/14 (2006.01) C07C 311/05 (2006.01) C07C 317/48 (2006.01) C07F 7/10 (2006.01) C07F 7/18 (2006.01) G03F 7/00 (2006.01) G03F 7/022 (2006.01) G03F 7/09 (2006.01)
Patent
CA 1329599
Abstract The present invention is directed to a styryl compound of the formula: Image (I) or Image (II) Image (VI) wherein R1, R2, and R11 are the same or different and represent a hydrogen atom, an optionally substituted alkyl, alkenyl or aralkyl group or R1 and R2 may together with the nitrogen atom to which they are bonded form a ring, which ring may inc- lude at least one hetero atom in addition to said nitrogen atom; R10 is an optionally substituted alkylene group; R3 is -OH, -OCOR5 or -OSi(R5)3 in which R5 is an alkyl group; R12 and R13 are independently a hydrogen atom, an optionally substituted lower alkyl or alkoxy group, an amide group or a halogen atom; X, Y, W and Z are the same or different and an electron attracting group, and n is a number of 2-15. The compounds of the present invention are suitable as light absorbers in photoresist compositions.
587099
Furuta Akihiro
Hanawa Ryotaro
Hioki Takeshi
Konishi Shinji
Tomioka Jun
Kirby Eades Gale Baker
Sumitomo Chemical Co. Ltd.
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