Styryl compounds, process for preparing the same and...

C - Chemistry – Metallurgy – 07 – C

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C07C 255/36 (2006.01) C07C 229/44 (2006.01) C07C 255/34 (2006.01) C07C 255/42 (2006.01) C07C 309/14 (2006.01) C07C 311/05 (2006.01) C07C 317/48 (2006.01) C07F 7/10 (2006.01) C07F 7/18 (2006.01) G03F 7/00 (2006.01) G03F 7/022 (2006.01) G03F 7/09 (2006.01)

Patent

CA 1329599

Abstract The present invention is directed to a styryl compound of the formula: Image (I) or Image (II) Image (VI) wherein R1, R2, and R11 are the same or different and represent a hydrogen atom, an optionally substituted alkyl, alkenyl or aralkyl group or R1 and R2 may together with the nitrogen atom to which they are bonded form a ring, which ring may inc- lude at least one hetero atom in addition to said nitrogen atom; R10 is an optionally substituted alkylene group; R3 is -OH, -OCOR5 or -OSi(R5)3 in which R5 is an alkyl group; R12 and R13 are independently a hydrogen atom, an optionally substituted lower alkyl or alkoxy group, an amide group or a halogen atom; X, Y, W and Z are the same or different and an electron attracting group, and n is a number of 2-15. The compounds of the present invention are suitable as light absorbers in photoresist compositions.

587099

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