C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/296, 260/297
C07D 213/55 (2006.01) C07C 59/72 (2006.01) C07C 69/712 (2006.01) C07D 213/63 (2006.01)
Patent
CA 1115708
ABSTRACT OF THE DISCLOSURE Substituted oxy-cyclohexylacetic acid derivatives use- ful as antihyperlipidemic agents have the formula Image (I) Image (II) Image (III) wherein n is 1 or 2; m is 0, 1 or 2; R1 represents a halogen atom; trifluoromethyl, a lower alkyl, a lower alkoxy, a lower alkyl- carbonyl, dimethylphenylmethyl, cyclohexyl, phenyl, halophenyl, phenoxy or halophenoxy group; and two of R1 groups may be bonded to form an orthocondensed saturated alkylene ring; Ha1 represents a halogen atom; and R2 represents a hydrogen atom or a lower alkyl group.
340946
Hamazaki Yasuhiko
Ishiyama Nobuo
Sakasai Masao
Sato Reiko
Seri Kenji
Kaken Chemical Co. Ltd.
Marks & Clerk
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