Substrate with a reduced light-scattering, ultraphobic...

Details Substrate with a reduced light-scattering, ultraphobic... Substrate with a reduced light-scattering, ultraphobic...

C - Chemistry, Metallurgy

03

C

C03C 17/38 (2006.01) C03C 17/42 (2006.01) C04B 41/81 (2006.01) C08J 7/04 (2006.01) C09K 3/18 (2006.01)

Patent

CA 2409959

The invention relates to a substrate with a reduced light-scattering, ultraphobic surface, to a method for the production of said substrate and to the use thereof. The substrate with a reduced light-scattering, ultraphobic surface has a total scatter loss <= 7 %, preferably <= 3 % and especially <= 1 % and a contact angle in relation to water of >= 140~, preferably >= 150~.

L'invention concerne un substrat ayant une surface ultraphobe diffusant peu la lumière, un procédé de fabrication de ce substrat, et son utilisation. Ledit substrat ayant une surface ultraphobe diffusant peu la lumière présente une perte de lumière diffusée <= 7 %, de préférence <= 3 %, de manière plus préférée <= 1 %, et un angle de mouillage par rapport à l'eau de >= 140·, de préférence de >= 150·.

Affiliated with

Also associated with

Rating

Substrate with a reduced light-scattering, ultraphobic... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate with a reduced light-scattering, ultraphobic..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate with a reduced light-scattering, ultraphobic... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1364175