C - Chemistry – Metallurgy – 03 – C
Patent
C - Chemistry, Metallurgy
03
C
C03C 21/00 (2006.01) C09K 15/00 (2006.01) C09K 15/02 (2006.01) C09K 15/04 (2006.01) C23C 8/02 (2006.01) C23C 8/42 (2006.01) G02B 1/00 (2006.01) G02B 5/08 (2006.01) G02B 5/10 (2006.01) C22B 58/00 (2006.01)
Patent
CA 2362106
The invention relates to a method of treating a liquid gallium or gallium alloy surface for prolonged use as a liquid mirror. The method of the invention comprises the steps of (a) contacting the surface of liquid gallium or gallium alloy with an aqueous solution of a halogenic acid to cause dissolution of any gallium oxide present on the surface, thereby obtaining an oxide-free liquid gallium or gallium alloy surface covered with a layer of the acid solution; (b) adding to the acid solution an aqueous solution of a surfactant present in an amount to form a single bimolecular layer of surfactant at an interface between the liquid gallium or gallium alloy and water; and (c) allowing a uniform passivating oxide layer to gradually form on the oxide-free liquid gallium or gallium alloy surface, the passivating oxide layer having surface irregularities smaller than 40 nm.
Bonneviot Laurent
Borra Ermanno F.
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
Universite Laval
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