Surfactant composition, degreasing composition and...

Details Surfactant composition, degreasing composition and... Surfactant composition, degreasing composition and...

C - Chemistry, Metallurgy

11

D

134/3.11

C11D 1/72 (2006.01) C11D 1/825 (2006.01) C11D 3/36 (2006.01) C23G 1/14 (2006.01) C11D 1/78 (2006.01)

Patent

CA 2014085

ABSTRACT OF THE DISCLOSURE The degreasing composition comprises a surfactant composition comprising a compound (a) represented by the general formula: R1O(AO)nH, wherein R1 is a substituted or unsubstituted hydrocarbon group having 6 or more carbon atoms; A is at least one group selected from the group consisting of an ethylene group, a propylene group, a butylene group and a styrene group, provided that an ethylene group in A is 5 mol or more per 1 mol of R1, and that the ethylene group is 50 mol % or more per 100 mol % of the A; and n is an integer of 5 - 50; and a compound (b) represented by the general formula: (R2O)x?(O(EO)n)yH, wherein R2 is a substituted or unsubstituted hydrocarbon group having 6 or more carbon atoms, E is an ethylene group, n is an integer of 1 - 20, x and y are 1 or 2, and x + y = 3, in a weight ratio of compound (a)/compound (b) = 10/90 - 95/5, and further comprises an alkali builder in a weight ratio [(compound (a) + compound (b))/alkali builder] of 1:0.1 - 1:2,000.

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