System and method for an intervertebral implant

Details System and method for an intervertebral implant System and method for an intervertebral implant

A - Human Necessities

61

F

A61F 2/46 (2006.01) A61B 17/16 (2006.01) A61B 17/17 (2006.01) A61F 2/44 (2006.01)

Patent

CA 2581818

The invention relates to the preparation of an intervertebral space with a trial implant (9), the insertion of an implant (5, 6, 7), the inserters (13, 16), and the method for feeding and inserting the implant (5, 6, 7) by means of an oblique anterior approach. In the novel improved method, the associated instruments (13, 16) for inserting an implant (5, 6, 7) into an intervertebral space, in particular for the lumbar spine at an oblique anterior angle of 45~ was developed, the left side of the body being preferred for insertion of the implant (5, 6, 7). Either the implant (5, 6, 7) can be inserted all in one, or first the upper part (5) and lower parts (7) and then the inlay (6) may be inserted. By insertion by means of the left oblique anterior approach at 45~, optimum utilization of the area of the intervertebral space is ensured (footprint), and better retention of theimplant is guaranteed by the exact chiselling at an angle of 90~ normal to the respective intervertebral surface.

L'invention concerne la préparation d'un espace intervertébral au moyen d'un implant d'essai (9), l'insertion d'un implant (5,6,7), les instruments d'introduction (13,16) et un procédé pour amener et insérer un implant (5,6,7) par approche antérieure oblique. Selon l'invention, les instruments associés (13,16) pour insérer un implant (5,6, 7) dans un espace intervertébral sont développés, en particulier pour la colonne lombaire à un angle antérieur oblique de 45°, le côté gauche du corps étant préféré pour l'insertion de l'implant (5,6,7). L'implant (5,6,7) peut être inséré en bloc ou bien d'abord la partie supérieure (5) et la partie inférieure (7), puis l'encastrement (6). L'insertion par approche antérieure oblique gauche à 45° permet d'optimiser l'utilisation de l'espace intervertébral (empreinte) et d'assurer une meilleure rétention de l'implant par ciselage précis à un angle de 90° d'équerre avec la surface intervertébrale.

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