C - Chemistry – Metallurgy – 23 – F
Patent
C - Chemistry, Metallurgy
23
F
149/14
C23F 1/34 (2006.01) C23F 1/46 (2006.01) H05K 3/26 (2006.01)
Patent
CA 2029444
ABSTRACT OF THE DISCLOSURE A process and related system is disclosed for etching copper with, and regenerating, a working alkaline ammoniacal etchant solution, the regeneration involving withdrawal of a portion of the working solution as spent etchant solution and electrolytic removal therefrom of at least a portion of the etched copper therein so as to produce a fresh etchant solution which is returned to the working solution; accumulation vessels upstream and downstream of the electrolytic process; and supply to the working solution and/or the fresh etchant solution of sufficient oxygen and ammonia to maintain the desired cupric ion content and pH in the working solution.
Gigas Bernd
Kukanskis Peter E.
Letize Raymond A.
Gigas Bernd
Kukanskis Peter E.
Letize Raymond A.
Macdermid Incorporated
Perley-Robertson Hill & Mcdougall
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