C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/209, 260/238
C07D 281/08 (2006.01) A61K 31/55 (2006.01) C07D 281/10 (2006.01) C07D 281/12 (2006.01) C07D 417/06 (2006.01)
Patent
CA 2016574
ABSTRACT There are described compounds of the formula: Image wherein R1 is ar(lower)alkyl which may have suitable substituent(s), R2 is hydrogen, lower alkyl which may have suitable substituent(s), or a group of the formula : Image (in which A is lower alkylene and X is halogen), n is 0, 1 or 2 and Y is -CH2-CH2 or Image , and a pharmaceutically acceptable salt thereof. A pro- cess for preparing these compounds, pharmaceutical compo- sitions containing same, the use thereof as an antagonist of PAF and a method for treating or preventing PAF-mediated diseases are also disclosed. The compounds and their salts are useful as a medicine for preventing and treating diseases such as allergic manifestations, such as asthma, thrombosis, shock, such as anaphylatic shock, anesthetic shock, cardiogenic shock, endotoxin shock, disseminated intravascular coagulation, nephropathy, nephritis, autoimmune diseases such as rhumatism, ulcers such as gastric ulcers, ischemia, cardiac infarction, septicemia and the like. They are also useful as immu- nosuppressant in transplantation.
Fukami Naoki
Hashimoto Masashi
Hemmi Keiji
Shima Ichiro
Fujisawa Pharmaceutical Co. Ltd.
Fukami Naoki
Hashimoto Masashi
Hemmi Keiji
Shima Ichiro
LandOfFree
Thiazepine derivatives does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thiazepine derivatives, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thiazepine derivatives will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1954395