C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
204/28, 204/39
C25D 3/32 (2006.01) C25D 3/36 (2006.01) C25D 3/56 (2006.01) C25D 3/60 (2006.01)
Patent
CA 1222476
ABSTRACT OF THE DISCLOSURE A tin, lead or tin-lead alloy plating bath, which comprises (A) a principal plating bath containing an alkanesulfonic or alkanolsulfonic acid, and either a divalent tin salt or a divalent lead salt thereof or both; (B) a surfactant comprising, at least one of: (a) a cationic surfactant selected from the group consisting of quarternary ammonium salts, alkyl pyridinium salts, alkyl imidazolinium salts and higher alkyl amine salts, (b) an amphoteric surfactant selected from betaines; and (c) a nonionic surfactant selected from the group consisting of condensation products of ethylene oxide and/or propylene oxide with a styrenated phenol, a higher alcohol, an alkylphenol, an alkylnaphthol, a fatty acid amide, a sorbitan or a phosphate; and (C) at least one of levelling agents selected from the group consisting or alkylidene sulfamic acids, quinolinol derivatives, benzotriazole derivatives, dialkylidene o-phenylene diamines, benzaldehyde derivatives, triazine derivatives, salicylic acid derivatives and nitriles.
437170
Dohi Nobuyasu
Masaki Seishi
Obata Keigo
Okada Yukiyoshi
Okuhama Yoshiaki
Daiwa Fine Chemicals Co. Ltd.
Gowling Lafleur Henderson Llp
Ishihara Chemical Co. Ltd.
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