C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
400/9309, 204/91
C08L 33/14 (2006.01) B05D 3/06 (2006.01) C08F 2/50 (2006.01) C08F 290/04 (2006.01) C08L 33/02 (2006.01) C08L 33/16 (2006.01) C09D 4/06 (2006.01)
Patent
CA 2164047
Cette composition photopolymérisable comprend un oligomère ayant des motifs de méthacrylate de trifluoroéthyle, un diluant et un amorceur de photopolymérisation. Elle donne des revêtements transparents hydrophobes.
Ameduri Bruno
Ballot Elsa
Boutevin Bernard
Legros Robert
Loubet Olivier
Elf Atochem S.a.
Swabey Ogilvy Renault
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