Ultra-thin film capacitor and method for manufacture thereof

H - Electricity – 01 – G

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334/22.2

H01G 4/10 (2006.01) H01G 4/08 (2006.01)

Patent

CA 1159918

ULTRA-THIN FILM CAPACITOR AND METHOD FOR MANUFACTURE THEREOF Abstract A suitable substrate is provided to which is applied a metal electrically conductive film electrode. The substrate and electrically conductive electrode film are then exposed to ion beam implantation of O+ or N+ ions to impregnate the surface of the metal electrode with O+ or N+ ions. Thereafter, the substrate and electrically conductive film having implanted O+ or N+ ions is annealed so as to stabi- lize the oxide structure which has been implanted into the surface of the electrically conductive film to provide an ultra-thin dielectric film. FI 9-79-058

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