Ultralow-loss silica glass and optical fibers using the same

C - Chemistry – Metallurgy – 03 – C

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C03C 13/04 (2006.01) C03C 3/06 (2006.01)

Patent

CA 2260988

This ultralow-loss glass is characterized in that high purity silica glass contains 1 to 500 wt.ppm of at least one network modifying oxide. It is assumed that the network modifying oxide appropriately loosens the tetrahedral network structure of silica and hence Rayleigh scattering is decreased. Examples of the network modifying oxide include Na 2 O, K 2 O, Li 2 O, MgO, CaO, and PbO. Since Rayleigh scattering losses are minimal in comparison with these of high purity silica glass, this impurity-added silica glass is excellent as a base material of a glass fiber for a long-distance transmission.

Un verre de silice à perte ultra faible se caractérise en ce qu'il comprend du verre de silice de grande pureté et au moins un oxyde modificateur du réseau en une quantité allant de 1 à 500 ppm (en poids). On considère que l'oxyde relaxe de manière appropriée la structure du réseau tétra-hydrique de la silice ce qui a pour conséquence d'abaisser la perte de dispersion de Rayleigh. Des exemples d'oxydes modificateurs du réseau utilisable dans ce domaine sont: na>2<O, K>2<O, Li>2<O, MgO, CaO, et PbO. Ce verre de silice contenant des impuretés se caractérise, par rapport à un verre de silice de grande pureté, par une perte de dispersion de Rayleigh réduite et est meilleure comme matériau de base pour des fibres de verre utilisées dans la transmission à grande distance.

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