Use as phosphor dot in a plasma or x-ray system of a...

Details Use as phosphor dot in a plasma or x-ray system of a... Use as phosphor dot in a plasma or x-ray system of a...

C - Chemistry, Metallurgy

09

K

C09K 11/81 (2006.01) C01B 25/26 (2006.01) C01F 17/00 (2006.01) C09K 11/77 (2006.01)

Patent

CA 2307132

The invention concerns the use as phosphor dot in a plasma or X-ray system, of a compound based on lanthanum phosphate comprising thulium. Said phosphate can further contain gadolinium. The compound thulium content, expressed in atomic % relative to lanthanum, ranges between 0.1 and 10, more particularly between 0.5 and 5. The invention also concerns a lanthanum phosphate characterised in that it comprises thulium and consists of particles of average size ranging between 1 and 20 µm and a dispersion index less than 0.6.

La présente invention concerne l'utilisation comme luminophore dans un système à plasma ou à rayonnement X, d'un composé à base d'un phosphate de lanthane comprenant du thulium. Ce phosphate peut contenir en outre du gadolinium. La teneur en thulium du composé, exprimée en % atomique par rapport au lanthane, est comprise entre 0,1 et 10, plus particulièrement entre 0,5 et 5. L'invention couvre aussi un phosphate de lanthane qui est caractérisé en ce qu'il comprend du thulium et en ce qu'il est constitué de particules de taille moyenne comprise entre 1 et 20 µm avec un indice de dispersion inférieur à 0,6.

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