Vacuum deposition apparatus and method and solar cell material

H - Electricity – 01 – L

Patent

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Details

H01L 21/205 (2006.01) C23C 16/46 (2006.01) H01L 21/31 (2006.01) H01L 31/04 (2006.01)

Patent

CA 2524487

A vacuum film-forming apparatus is disclosed wherein a film is formed by introducing a substrate (17) heated by a substrate heating unit (3) into a film formation chamber (11). The substrate heating unit (3) has a heating chamber (23), a flat plate nozzle (33) which is so arranged in the heating chamber (23) as to have a desired distance from the surface of the substrate (17) carried into the heating chamber (23) and has a gas feed port (34), and a heated gas feeding unit (32) for supplying a heated gas into the gas feed port (34) of the plate nozzle (33). A face plate (33a) of the plate nozzle (33) facing the substrate (17) is provided with a plurality of gas jet orifices (35) for heating the substrate (17) with heated gas jets coming therefrom and hitting the substrate (17).

Cette invention concerne un appareil de formation de couches sous vide dans lequel une couche est formée selon un procédé consistant à introduire un substrat (17) chauffé par une unité de chauffage de substrat (3) dans une chambre de formation de couches (11). L'unité de chauffage de substrat (3) comprend une chambre de chauffage (23), une buse en plaque plane (33) disposée dans la chambre de chauffage (23) de façon qu'elle se trouve à une certaine distance de la surface du substrat (17) introduit dans la chambre de chauffage (23) et comprenant également un orifice d'amenée de gaz (34), ainsi qu'une unité d'alimentation en gaz chauffé (32) servant à envoyer un gaz chauffé dans l'orifice d'amenée de gaz (34) de la buse plane (33). Une plaque avant (33a) de la buse en plaque (33) orientée face au substrat (17) est munie d'une pluralité d'orifices de jets de gaz (35) servant à chauffer le substrat (17), des jets de gaz chauffé sortant des orifices et venant heurter le substrat.

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