C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
C08F 20/04 (2006.01) A61L 15/00 (2006.01) A61L 15/20 (2006.01) A61L 15/46 (2006.01) A61L 15/60 (2006.01) C08F 8/00 (2006.01) C08F 251/00 (2006.01) C08F 251/02 (2006.01) C08F 261/04 (2006.01) C08F 265/02 (2006.01) C08F 265/04 (2006.01) C08F 291/00 (2006.01) C08L 51/00 (2006.01) C08L 51/02 (2006.01) C09D 151/02 (2006.01)
Patent
CA 2333131
The invention relates to absorbent polymers based on optionally partially neutralised, monoethylenically unsaturated, acid group-carrying monomers. The surfaces of said polymers are re-cross-linked. The inventive polymers also have cyclodextrines and/or cyclodextrine derivatives which are covalently and/or ionically bonded and/or included therein.
L'invention concerne des polymères absorbants à base de monomères portant des groupes acide monoéthyléniquement insaturés éventuellement neutralisés partiellement, dont les surfaces sont post-réticulées, et qui présentent des cyclodextrines et/ou des dérivés de cyclodextrine liés par covalence et/ou par voie ionique et/ou inclus.
Bruhn Christoph
Herrmann Edgar
Issberner Jorg
Kersten Dagmar
Mertens Richard
Borden Ladner Gervais Llp
Stockhausen Gmbh
Stockhausen Gmbh & Co. Kg
LandOfFree
Water-absorbing polymers having supramolecular hollow... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Water-absorbing polymers having supramolecular hollow..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Water-absorbing polymers having supramolecular hollow... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1510649