C - Chemistry – Metallurgy – 02 – F
Patent
C - Chemistry, Metallurgy
02
F
C02F 1/00 (2006.01) B01D 61/18 (2006.01) B01D 63/04 (2006.01) B01D 65/02 (2006.01) B01D 65/08 (2006.01)
Patent
CA 2312735
There is here disclosed a water treatment apparatus in which a membrane separation device is disposed above a gas diffuser device arranged in a treating tank, wherein diameters of gas discharge holes formed in the gas diffuser device are within a range of 1 to 10 mm, and a relational expression of 20<X/Y<300 is satisfied wherein X is a sectional area (cm2) of the membrane separation device in a horizontal direction, and Y is the number of the gas discharge holes of the gas diffuser device. According to this water treatment apparatus, the clogging of the pores in the surface of a separation membrane with a suspended substance can be inhibited, so that a stable filtration is possible for a long period of time.
L'invention concerne un appareil de traitement de l'eau, comprenant un dispositif de séparation par membrane disposé au-dessus d'un dispositif d'aération disposée dans une cuve de traitement. Ledit appareil est caractérisé en ce que la taille des orifices d'évacuation de gaz dont est pourvu le dispositif d'aération est comprise entre 1 et 10 mmo, et en ce qu'une surface transversale X (cm<2>) du dispositif de séparation par membrane dans un sens horizontal et le nombre Y des orifices d'évacuation de gaz du dispositif d'aération satisfont la relation 20<X/Y<300. Dans l'appareil de traitement de l'eau de l'invention, les matières en suspension bouchent rarement les pores que présente la surface de la membrane de séparation, ce qui permet d'obtenir un filtrage stable et de longue durée.
Honjyo Kenji
Katou Osami
Kobayashi Masumi
Miyashita Satoshi
Okazaki Hiroyuki
Goudreau Gage Dubuc
Mitsubishi Rayon Co. Ltd.
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