G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/20 (2006.01) H01L 21/027 (2006.01) H01L 21/70 (2006.01)
Patent
CA 2081642
X-rays enter an airtight chamber through a beam duct, pass through a transmission window, and expose a wafer and mask disposed outside the airtight chamber. The wafer and mask are held by a wafer chuck and a mask holder, respectively. The mask holder includes a pressure sensor, which detects variations in the atmospheric pressure. An output from the pressure sensor is converted into a change in the intensity of the x-rays by an arithmetic unit, and is transmitted to a control unit, which controls a driving unit of a shutter. By thus controlling the moving speed of the shutter in accordance with variations in the atmospheric pressure, it is possible to prevent variations in the amount of x-ray exposure of the wafer.
Des rayons X pénètrent dans une chambre hermétique par une canalisation, traversent une fenêtre de transmission et tombent sur une plaquette et un masque placés à l'extérieur de la chambre. La plaquette et le masque ont des supports individuels. Le support du masque comprend un capteur de pression qui détecte les variations de la pression atmosphérique. Le signal de sortie de ce capteur est converti en une variation d'intensité des rayons X par une unité arithmétique et est transmis à une unité de commande qui commande l'actionnement d'un obturateur. En commandant la vitesse de l'obturateur selon les variations de la pression atmosphérique, on peut empêcher les variations d'exposition aux rayons X pour la plaquette.
Canon Kabushiki Kaisha
Ridout & Maybee Llp
LandOfFree
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