Lithographic process using mask with small opaque or...

Details Lithographic process using mask with small opaque or... Lithographic process using mask with small opaque or...

G - Physics

03

F

356/147

G03F 7/20 (2006.01) G03F 1/14 (2006.01)

Patent

CA 1285664

LITHOGRAPHIC PROCESS USING MASK WITH SMALL OPAQUE OR TRANSPARENT ELEMENTS Abstract A lithographic process having improved image quality by employing a mask that includes a plurality of opaque elements or transparent elements that are smaller than the resolution of the lithography to be employed in order to control the transmittance of the actinic light exposure area.

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