Process and apparatus for preparing superconducting thin films

Details Process and apparatus for preparing superconducting thin films Process and apparatus for preparing superconducting thin films

C - Chemistry, Metallurgy

23

C

C23C 14/35 (2006.01) C23C 14/08 (2006.01) H01L 39/24 (2006.01)

Patent

CA 2045267

A process for preparing a thin film of high-temperature compound oxide superconductor on a substrate by magnetron sputtering method. A substrate and a target are arranged in parallel with each other in a vacuum chamber and one of the substrate and the target is moved relatively and in parallel with another during the thin film is formed by sputtering.

Cette invention concerne un procédé de dépôt d'une couche mince d'oxyde supraconductrice haute température sur un substrat par la technique de pulvérisation magnétron. Un substrat et une cible sont disposés parallèlement l'un à l'autre dans une chambre sous vide et l'un des deux est déplacé par rapport à l'autre tout en conservant le parallélisme pendant le dépôt de la couche mince par pulvérisation.

Affiliated with

Also associated with

Rating

Process and apparatus for preparing superconducting thin films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process and apparatus for preparing superconducting thin films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process and apparatus for preparing superconducting thin films will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1540002