Methods and apparatus for producing low flow rates of...

C - Chemistry – Metallurgy – 03 – B

Patent

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C03B 8/00 (2006.01) B01J 4/00 (2006.01) B01J 19/26 (2006.01) C03B 19/06 (2006.01) C03B 19/14 (2006.01) C03B 20/00 (2006.01)

Patent

CA 2295684

A method and apparatus for producing feedstock vapors utilized in the manufacturing of silica glass is provided. The apparatus includes a means for providing a constant flow of a liquid feedstock (22), a means providing an injector gas (24), a mixer (28), an injector tube (30) having an injector entrance (34) and injector orifice (36), a means for flowing a carrier gas (26), a vaporizer chamber (32) and a vapor feedstock delivery conduit (38) which delivers feedstock vapors to a conversion site where it is converted to a silica glass. The invention produces beneficial low flow rates of feedstock vapors, particularly suited for use in the manufacture of planar optical waveguides and lightwave optical circuits.

L'invention concerne un procédé et un appareil permettant de produire des vapeurs de charge d'alimentation utilisées dans la production de verre de silice. L'appareil comprend un moyen destiné à produire un flux constant d'une charge d'alimentation liquide (22), un moyen produisant un gaz injecteur (24), un mélangeur (28), un tube injecteur (30) doté d'une entrée (34) et d'un orifice injecteur (36), un moyen destiné à l'écoulement d'un gaz porteur (26), une chambre de vaporisation (32) et un conduit (38) destiné à délivrer des vapeurs de charge d'alimentation à un site de conversion qui les transforme en verre de silice. L'invention permet d'obtenir des vapeurs de charge d'alimentation de faibles débits utiles, convenant particulièrement à l'utilisation dans la production de guides d'ondes optiques planaires et des circuits optiques à ondes lumineuses.

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