Silicon oxide based thin film vapour barriers

C - Chemistry – Metallurgy – 23 – C

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C23C 14/10 (2006.01) C23C 16/40 (2006.01) C23C 16/52 (2006.01)

Patent

CA 2048168

ABSTRACT A flexible polymer substrate, particularly useful for medical or food packaging applications, defines a surface that carries a thin film. The surface and thin film together have a permeability to oxygen gas that is less than about 0.1 cc/100in2/day. The thin film has a thickness less than about 1000 .ANG.. The thin film includes a substantially inorganic silicon oxide. The film is deposited in a previously evacuated chamber by glow discharge from a gas stream that includes a volatilized organosilicon component, an oxygen component, and an inert gas component.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Silicon oxide based thin film vapour barriers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silicon oxide based thin film vapour barriers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon oxide based thin film vapour barriers will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1957183

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.