Method for producing a surface structure on an implant, and...

A - Human Necessities – 61 – C

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A61C 8/00 (2006.01) A61C 13/00 (2006.01) A61F 2/30 (2006.01) A61F 2/00 (2006.01)

Patent

CA 2470304

A surface structure is produced on an outer surface of an implant or a fixture and forms a base structure in a range of implants related to different types and qualities of jaw bone. During production of the surface, parts of a turning tool are placed against the implant or against a blank which is intended to form the implant. The parts and/or the implant are assigned controls which give rise to mutual displacements between the parts and the implant so that the parts follow a substantially spiral trajectory along the outer surface. By means of said controls, a long wave pattern is formed with successive peaks and with through lying between these. In this connection, a through can be arranged adjacent to the outer parts of an existing thread. The controls are chosen so as to produce through depths in the range of 25 to 250 ~m, preferably 50 to 200 ~m. The invention also relates to an implant which has the same character as the implant produced by the method.

Selon cette invention, une structure produite sur une surface externe d'un implant ou d'une fixation, forme une structure de base dans un ensemble d'implants relatifs à différents types et qualités d'os de mâchoire. Au cours de la fabrication de la surface, des parties d'un outil de tournage sont placées contre l'implant ou contre une ébauche destinée à former l'implant. A ces parties et/ou à l'implant sont affectées des commandes qui donnent lieu à des déplacements mutuels entre les parties et l'implant de sorte que les parties suivent une trajectoire sensiblement en spirale le long de la surface externe. Au moyen de ces commandes, un motif à ondes longues est formé de crêtes et de creux successifs, intercalés. Selon cette configuration, un creux peut être adjacent aux parties externes d'un filetage existant. Les commandes sont sélectionnées de façon à former des creux dont la profondeur est comprise entre 25 et 250 µm, de préférence entre 50 et 200 µm. L'invention porte également sur un implant présentant les mêmes caractéristiques que l'implant obtenu selon ce procédé.

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