Method for the production of bubble-free objects of quartz...

Details Method for the production of bubble-free objects of quartz... Method for the production of bubble-free objects of quartz...

C - Chemistry, Metallurgy

03

C

49/78.1

C03C 3/06 (2006.01)

Patent

CA 1071409

ABSTRACT OF THE DISCLOSURE Method for the production of quartz glass objects starting from a melt of silicon dioxide in a helium-hydrogen atmosphere. Oxides or hydroxides of at least one of K, Mg, Ca, Sr or Ba are added in a quantity of between 5 x 10-3 and 200 x 10-3 mol.%. The quartz glass obtained has consequently considerably fewer trapped gas bubbles.

239642

Affiliated with

Also associated with

Rating

Method for the production of bubble-free objects of quartz... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for the production of bubble-free objects of quartz..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the production of bubble-free objects of quartz... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-609079