4. C - Chemistry, Metallurgy
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Erwin Vanderstraeten

C - Chemistry – Metallurgy – 23 – C

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Country: Belgium

Apparatus and method for sputtering a magnetron target

C - Chemistry – Metallurgy – 23 – C
Patent

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Apparatus for affixing a rotating cylindrical magnetron...

C - Chemistry – Metallurgy – 23 – C
Patent

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Apparatus and method for sputtering a magnetron target

C - Chemistry – Metallurgy – 23 – C
Patent

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Profile ID: LFCA-PAI-P-1683951

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