4. C - Chemistry, Metallurgy
  5. 21
  6. D

Guy Gobin

C - Chemistry – Metallurgy – 21 – D

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Country: Belgium

Apparatus and method for sputtering a magnetron target

C - Chemistry – Metallurgy – 23 – C
Patent

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Apparatus for affixing a rotating cylindrical magnetron...

C - Chemistry – Metallurgy – 23 – C
Patent

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Sealing elements for feeding through at least one elongated...

C - Chemistry – Metallurgy – 21 – D
Patent

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Apparatus and method for sputtering a magnetron target

C - Chemistry – Metallurgy – 23 – C
Patent

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Profile ID: LFCA-PAI-P-1477660

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