C - Chemistry – Metallurgy – 21 – D
Inventor
C - Chemistry, Metallurgy
21
D
Inventor
Country: United States Of America
Amorphous barrier layer in a ferroelectric memory cell
Annealing of a crystalline perovskite ferroelectric cell and...
Barrier layer for ferroelectric capacitor integrated on silicon
C-axis perovskite thin films grown on silicon dioxide
Crystallographically aligned ferroelectric films usable in...
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