4. C - Chemistry, Metallurgy
  5. 23
  6. C

Steven Morgan

C - Chemistry – Metallurgy – 23 – C

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Country: United States Of America

Apparatus and method for sputtering a magnetron target

C - Chemistry – Metallurgy – 23 – C
Patent

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Apparatus for affixing a rotating cylindrical magnetron...

C - Chemistry – Metallurgy – 23 – C
Patent

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Apparatus and method for sputtering a magnetron target

C - Chemistry – Metallurgy – 23 – C
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

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Profile ID: LFCA-PAI-P-1683950

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