C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
167/205, 260/235
C07C 405/00 (2006.01) A61K 31/557 (2006.01) C07F 7/08 (2006.01)
Patent
CA 1322197
Abstract of the Disclosure The invention relates to 9-halogen-(Z) prostane derivatives of formula I Image (I), Image or Image in which Z represents the radicals Hal represents a chlorine or fluorine atom in the alpha or beta position, R1 represents the radical Image with R2 meaning a hydrogen atom, an alkyl, cycloalkyl, aryl or heterocyclic radical or R1 represents the radical Image with R3 meaning an acid radical or the radical R2 and A represents a -CH2-CH2-, a trans-CH=CH or -C?C group, W represents a free or a functionally modified Image group, and the respective OH groups can be in the alpha or beta position, D and E together represent a direct bond or D represents a straight-chain alkylene group with 1- 10 C atoms, a branched-chain alkylene group with 2- 10 C atoms or an annular alkylene group with 3-10 C atoms, which optionally can be substituted by flourine atoms, and E represents an oxygen or sulfur atom, a direct bond, a C?C bond or a -CR6=CR7 group, and R6 and R7 are different and mean a hydrogen atom, a chlorine atom or a C1-C4 alkyl group, R4 represents a free or functionally modified hydroxy group, R5 means a hydrogen atom, an alkyl, a halogen- substituted alkyl, a cycloalkyl or an optionally substituted aryl or a heterocyclic group, and if R2 means a hydrogen atom, its salts with physiologically compatible bases or its cyclodextrin chlathrates, process for their production and their pharmaceutical use.
572235
Buchmann Bernd
Elger Walter
Loge Olaf
Raduchel Bernd
Skuballa Werner
Marks & Clerk
Schering Aktiengesellschaft
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