H - Electricity – 01 – L
Patent
H - Electricity
01
L
H01L 29/786 (2006.01) H01L 21/363 (2006.01) H01L 21/428 (2006.01) C01G 9/02 (2006.01) C01G 15/00 (2006.01) C01G 19/02 (2006.01)
Patent
CA 2585190
A novel amorphous oxide applicable, for example, to an active layer of a TFT is provided. The amorphous oxide comprises microcrystals.
L'invention concerne un nouvel oxyde amorphe convenant par exemple pour former la couche active d'un transistor TFT. Cet oxyde amorphe comprend des microcristaux.
Hosono Hideo
Kamiya Toshio
Nakagawa Katsumi
Nomura Kenji
Sano Masafumi
Canon Kabushiki Kaisha
Ridout & Maybee Llp
Tokyo Institute Of Technology
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