Controlling electromechanical behavior of structures within...

Details Controlling electromechanical behavior of structures within... Controlling electromechanical behavior of structures within...

B - Operations, Transporting

81

B

B81B 7/02 (2006.01) B81C 99/00 (2010.01) H01L 21/00 (2006.01) H01L 21/302 (2006.01) H01L 21/461 (2006.01) H01L 29/82 (2006.01)

Patent

CA 2499208

In one embodiment, the invention provides a method for fabricating a microelectromechanical system device. The method comprises fabricating a first layer (14) comprising a film (14) having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer (14) by at least reducing charge build up thereon during activation of the microelectromechanical systems device.

Dans un mode de réalisation, l'invention concerne un procédé pour fabriquer un dispositif à systèmes microélectromécaniques. Le procédé comprend : la réalisation d'une première couche comprenant un film ayant une réponse électromécanique caractéristique, et une réponse optique caractéristique, la réponse optique caractéristique étant souhaitable et la réponse électromécanique caractéristique ne l'étant pas ; et la modification de la réponse électromécanique caractéristique sur la première couche par réduction au moins partielle de l'accumulation de charge sur celle-ci au cours de l'activation du dispositif à systèmes microélectromécaniques.

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