B - Operations – Transporting – 81 – C
Patent
B - Operations, Transporting
81
C
B81C 99/00 (2010.01) B82Y 30/00 (2011.01) B01J 2/00 (2006.01) B05D 3/06 (2006.01) B81B 1/00 (2006.01)
Patent
CA 2660832
A method of producing particles includes providing a substrate structure that comprises a solid substrate; forming a target structure on said substrate structure, said target structure comprising a radiation-reactive material; forming a spatially patterned beam of radiation using a patterned mask; exposing at least a portion of the target structure to the spatially patterned beam of radiation to which the radiation-reactive material reacts while leaving other portions of the target structure unexposed to the radiation; removing substantially all of one of the exposed or the unexposed patterned portions of the target structure to provide a plurality of non-contiguous structures that include at least a portion of the radiation-reactive material; and separating the plurality of non-contiguous structures comprising the radiation-reactive material from the substrate structure into a fluid material. Each non-contiguous structure of the radiation-reactive material provides at least a portion of a separate particle after the separation.
L'invention concerne un procédé de production de particules, consistant à utiliser une structure composée d'un substrat solide, à former une structure cible sur ladite structure, ladite structure cible comprenant un matériau sensible au rayonnement, à former un faisceau de rayonnement spatialement modélisé à l'aide d'un masque modélisé, à exposer au moins une partie de la structure cible au faisceau de rayonnement spatialement modélisé auquel réagit le matériau sensible au rayonnement, tout en laissant d'autres parties de la structure cible non exposées au rayonnement, à éliminer sensiblement toutes les parties modélisées exposées ou non exposées de la structure cible pour obtenir une pluralité de structures non adjacentes comprenant au moins une partie du matériau sensible au rayonnement, et à séparer la pluralité de structures non adjacentes comprenant le matériau sensible au rayonnement de la structure substrat en matériau fluide. Chaque structure non adjacente du matériau sensible au rayonnement présente au moins une partie d'une particule séparée après la séparation.
Hernandez Carlos J.
Mason Thomas G.
Fournier Claude
The Regents Of The University Of California
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