Decal transfer microfabrication

B - Operations – Transporting – 81 – C

Patent

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Details

B81C 1/00 (2006.01) B32B 3/00 (2006.01) B44C 1/165 (2006.01) C03C 25/68 (2006.01) G03F 7/00 (2006.01)

Patent

CA 2495978

A method of making a microstructure includes forming a pattern in a surface of a silicon-containing elastomer, oxidizing the pattern, contacting the pattern with a substrate; and bonding the oxidized pattern and the substrate such that the pattern and the substrate are irreversibly attached. The silicon- containing elastomer may be removably attached to a transfer pad.

L'invention concerne un procédé permettant de fabriquer une microstructure. Ledit procédé consiste à former un motif dans une surface d'élastomère contenant du silicium, à oxyder ledit motif, à mettre ce motif en contact avec un substrat, et à lier le motif oxydé et le substrat de sorte que ceux-ci sont fixés de manière irréversible. L'élastomère contenant du silicium peut être fixé de manière amovible à un bloc de transfert.

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