Fabrication of metallic microstructures via exposure of...

Details Fabrication of metallic microstructures via exposure of... Fabrication of metallic microstructures via exposure of...

B - Operations, Transporting

81

C

B81C 1/00 (2006.01) C23C 18/16 (2006.01) C25D 5/54 (2006.01) H01L 21/768 (2006.01) H05K 3/00 (2006.01) H05K 3/10 (2006.01) H05K 3/18 (2006.01)

Patent

CA 2396570

A method of forming microstructures. An article (110) including a metal atom precursor (120) is disproportionally exposed to electromagnetic radiation in an amount and intensity sufficient to convert some of the precursor to elemental metal (160). Additional conductive material may then be deposited onto the elemental metal to produce a microstructure.

La présente invention concerne un procédé de fabrication de microstructures qui consiste en l'exposition disproportionnée d'un objet (110) comportant un précurseur (120) d'atome métallique à un rayonnement électromagnétique en une quantité et une intensité suffisante à convertir une partie du précurseur en métal (160) élémentaire. On peut ensuite effectuer un dépôt d'un matériau conducteur additionnel en vue de produire une microstructure.

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