High aspect ratio patterning of glass film

C - Chemistry – Metallurgy – 03 – C

Patent

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Details

C03C 10/00 (2006.01) C03C 15/00 (2006.01) G02B 6/13 (2006.01) G02B 6/136 (2006.01) G02B 6/12 (2006.01)

Patent

CA 2389699

A relatively facile, inexpensive method for patterning a layer of glass or a substrate involves patterning a seed material containing a nucleating agent adjacent a layer of thermally-crystallizable glass and heat treating the seed material and the layer of thermally-crystallizable glass to induce highly oriented crystal growth from the seed material through the thickness of the thermally-crystallizable glass layer at selected portions thereof. After the heat treatment, the layer of thermally-crystallizable glass is converted into a desired pattern of glass surrounded by crystalline material. The crystalline material is removed with an etchant to leave a desired glass pattern.

L'invention concerne un procédé relativement facile et peu coûteux de création de motifs sur une couche de verre ou un substrat qui implique de créer des motifs sur un matériau d'ensemencement contenant un agent nucléant jouxtant une couche de verre thermiquement cristallisable et de traiter à chaud ledit matériau et le verre thermiquement cristallisable afin d'induire un tirage de cristal à orientation élevée du matériau d'ensemencement traversant l'épaisseur de la couche thermiquement cristallisable au niveau des zones choisies de celle-ci. Après traitement à chaud, ladite couche est convertie en un certain motif de verre entouré de matériau cristallin. Le matériau cristallin est éliminé au moyen d'un agent d'attaque chimique de façon à laisser un certain motif de verre.

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