Method and apparatus for controlled manufacturing of...

B - Operations – Transporting – 81 – B

Patent

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B81B 1/00 (2006.01)

Patent

CA 2519896

The invention relates to a method for manufacturing nanometer-scale apertures, wherein, in an object, in a conventional manner, at least one aperture is provided with a nanometer-scale surface area, after which, by means of an electron beam, energy is supplied to at least the edge of said at least one aperture, such that the surface area of the respective aperture is adjusted, wherein the surface area of the aperture is controlled during adjustment and the supply of energy is regulated on the basis of the surface area change.

L'invention concerne un procédé permettant de former des ouvertures d'échelle nanométrique. Ce procédé consiste à former d'une manière conventionnelle au moins une ouverture présentant une superficie d'échelle nanométrique dans un objet, puis à procéder à une application d'énergie au moyen d'un faisceau électronique, au moins sur le bord de cette/ces ouverture(s), afin de modifier la superficie de l'ouverture correspondante, la superficie de l'ouverture étant contrôlée pendant cette modification, et l'apport d'énergie étant régulé en fonction de la modification de cette superficie.

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