Method of fabricating a suspended microstructure with a...

Details Method of fabricating a suspended microstructure with a... Method of fabricating a suspended microstructure with a...

B - Operations, Transporting

81

C

B81C 1/00 (2006.01) B81B 1/00 (2006.01)

Patent

CA 2351132

The method of fabricating a suspended microstructure with a sloped support, comprises the steps of (a) providing a member having three stacked up layers including a first substrate layer, a second temporary layer and a third photoresist layer; (b) photolithographically transferring a sloped pattern to the third photoresist layer by means of a grey scale mask; (c) etching the second layer through the third layer resulting from step (b) to obtain a surface with at least one continuous slope with a predetermined angle with respect to the first surface layer; (d) depositing a fourth layer on the previous layers; (e) etching the fourth layer to obtain the sloped support; and (f) removing the second layer to obtain the microstructure with the sloped support. The invention is also concerned with a suspended microstructure fabricated by the method.

Affiliated with

Also associated with

Rating

Method of fabricating a suspended microstructure with a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of fabricating a suspended microstructure with a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating a suspended microstructure with a... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1749910