Photoresist composition

Details Photoresist composition Photoresist composition

G - Physics

03

F

96/150

G03F 7/004 (2006.01) G03F 7/022 (2006.01) G03F 7/039 (2006.01) G03F 7/09 (2006.01)

Patent

CA 2014287

- 20 - ABSTRACT OF THE DISCLOSURE A photoresist composition which comprises a com- pound of the general formula: Image (I) wherein R1, R2 and R3 are the same or different and repre- sent a hydrogen atom, a hydroxyl group, -OCOR4, -O-R5, -OSi(R6)3, a halogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group, an optio- nally substituted phenyl group or an optionally substituted aralkyl group; R4, R5 and R6 represent an optionally substi- tuted lower alkyl group or an optionally substituted phenyl group; X and Y are the same or different and represent -CN, -COOR7, -CONR8R9, or Image Image R7 represents an alkyl group; R8 and R9 are the same or different and represent a hydrogen atom, an optionally substituted alkyl or phenyl group; R10 represents a hydrogen atom, an optionally substituted alkyl group or a hydroxyl group; and a is a number of 1 to 2, which is suitable for forming fine patterns having high resolution on a substrate having high reflectance.

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