Polymeric compounds

Details Polymeric compounds Polymeric compounds

C - Chemistry, Metallurgy

08

F

96/175, 402/320

C08F 8/36 (2006.01) G03F 7/038 (2006.01)

Patent

CA 1338947

A polymeric material for use in radiation sensitive compositions for coatings in printing plate production or photoresists is derived from a polymer having a plurality of pendant hydroxy groups attached to the polymer backbone, or a side chain thereof, and includes sulphonate groups selected from the group consisting of the following sulphonate groups: Image Image and where X is an aliphatic, aromatic, carbocyclic or heterocyclic group; Y is hydrogen, halogen, or an alkyl, aryl, alkoxy, aryloxy or aralkyl group, CO2-Z+, CO2R or SO3-Z+; Z+ is a cationic counter-ion, R is hydrogen, alkyl, alkylene, aryl or aralkyl group and Oa is derived from a hydroxyl group of the polymer, less H.

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