G - Physics – 03 – F
Patent
G - Physics
03
F
96/150
G03F 7/004 (2006.01)
Patent
CA 2011728
Abstract of the Disclosure A positive radiation-sensitive mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and an acid-cleavable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa value of less than about 12 or is a derivative of a compound having such a pKa value which can be converted into the free compound by acid catalysis. A positive recording material and a process for recording high- energy radiation using the material are also disclosed. The mixture, and in particular the recording material produced therefrom, has relatively high sensitivity and improved resolution and, in addition, does not exhibit image fogging after development.
Dammel Ralph
Lingnau Juergen
Pawlowski Georg
Theis Juergen
Dammel Ralph
Fetherstonhaugh & Co.
Hoechst Aktiengesellschaft
Lingnau Juergen
Pawlowski Georg
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