C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
402/262, 260/613
C08G 59/40 (2006.01) C07C 381/12 (2006.01) C07F 9/92 (2006.01) G03F 7/029 (2006.01)
Patent
CA 2002425
Sulfonium salts of the formula: Image wherein Ar is a fused aromatic radical; R1 is a divalent organic bridge; each R2 and R3 individually is an alkyl, aryl, alkaryl, aralkyl or substituted aryl, provided that not more than one of R2 and R3 is alkyl; and A is a non-nucleophilic anion; use thereof and preparation thereof. The sulfonium salts are useful as photoinitiators and reduce the exposure requirement for photochemically induced cationic polymerization.
Angelo Raymond W.
Gelorme Jeffrey D.
Kuczynski Joseph P.
Lawrence William H.
Pappas Socrates P.
International Business Machines Corporation
Macchione Alfred A.
North Dakota State University
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