4. C - Chemistry, Metallurgy
  5. 30
  6. B

Masakiyo Ikeda

C - Chemistry – Metallurgy – 30 – B

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

Country: Japan

Chemical vapor deposition method for the gaas thin film

C - Chemistry – Metallurgy – 30 – B
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Chemical vapor deposition method for the thin film of...

C - Chemistry – Metallurgy – 23 – C
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Vapor deposition method for the gaas thin film

C - Chemistry – Metallurgy – 23 – C
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Chemical vapor deposition method for the gaas thin film

C - Chemistry – Metallurgy – 30 – B
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Vapor deposition method for the gaas thin film

C - Chemistry – Metallurgy – 23 – C
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Masakiyo Ikeda does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Masakiyo Ikeda, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Masakiyo Ikeda will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-P-1096943

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure