4. C - Chemistry, Metallurgy
  5. 23
  6. F

Pierre Vanden Brande

C - Chemistry – Metallurgy – 23 – F

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Country: Belgium

Method and device for continuous cold plasma deposition of...

C - Chemistry – Metallurgy – 23 – C
Patent

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Method and device for plasma treatment of moving metal...

C - Chemistry – Metallurgy – 23 – F
Patent

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Molecular pump

F - Mech Eng,Light,Heat,Weapons – 04 – D
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Process and device for forming a coating on a substrate by...

C - Chemistry – Metallurgy – 23 – C
Patent

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Vacuum pump

F - Mech Eng,Light,Heat,Weapons – 04 – F
Patent

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Molecular pump

F - Mech Eng,Light,Heat,Weapons – 04 – D
Patent

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Vacuum pump

F - Mech Eng,Light,Heat,Weapons – 04 – F
Patent

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Profile ID: LFCA-PAI-P-1373483

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