4. H - Electricity
  5. 01
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Toshihide Ieki

H - Electricity – 01 – L

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Country: Japan

Method of forming a metal oxide film and microwave power...

C - Chemistry – Metallurgy – 23 – C
Patent

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Method of treatment with a microwave plasma

H - Electricity – 01 – L
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Silicon oxide film

C - Chemistry – Metallurgy – 23 – C
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Profile ID: LFCA-PAI-P-1364846

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