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Fabrication of electrically insulating regions in optical...

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Fabrication of electronic devices with an internal window

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Fabrication of fets

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Fabrication of gallium arsenide devices

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Fabrication of gallium nitride layers by lateral growth

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Fabrication of gallium nitride semiconductor layers by...

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Fabrication of grooved semiconductor devices

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Fabrication of heterojunction solar cells by improved tin...

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Fabrication of high-speed dielectrically isolated devices...

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Fabrication of integrated circuit structures with full...

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Fabrication of integrated circuits utilizing thick...

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Fabrication of integrated circuits with field effect...

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Fabrication of integrated semiconductor devices by...

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Fabrication of interlayer conductive paths in integrated...

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Fabrication of mesa devices by mbe growth over channeled...

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Fabrication of mesa diode with channel guard

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Fabrication of microminiature devices using plasma etching...

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Fabrication of monolithic integrated circuits using...

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Fabrication of patterned lines of high t -superconductors

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Fabrication of power field effect transistors and the...

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